Reticle Intensity Based Critical Dimension Uniformity to Improve Efficiency for Doma Correction in A Foundry

Kin Wai Tang,Teng Hwee Ng, Lei Huang,Susan Ng, Thomas Ku,Wee Teck Chia,Lin Chua, William Li,Aaron Chin,Aditya Dayal, Tom Vavul,Trent Hutchinson

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（2012）

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Key words
iCDU,intra-field CDU,transistor performance,yield
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