New Critical Dimension Uniformity Measurement Concept Based Reticle Inspection Tool

KangJoon Seo,MunSik Kim,Sang Chul Kim,JaeCheon Shin,ChangYeol Kim,John Miller,Aditya Dayal,Trent Hutchinson,KiHun Park

PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XVII（2010）

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Key words
Critical Dimension Uniformity (CDU),CD-SEM,reticle inspection-based,CDU map
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