32-Nm SOC Printing with Double Patterning, Regular Design, and 1.2 NA Immersion Scanner
Yorick Trouiller,Vincent Farys,Amandine Borjon,Jerome Belledent,Christophe Couderc,Frank Sundermann,Jean-Christophe Urbani,Yves Rody,Christian Gardin,Jonathan Planchot,Will Conley,Pierre-Jerome Goirand,Scott Warrick,Frederic Robert,Gurwan Kerrien,Florent Vautrin, Bill Wilkinson,Mazen Saied,Emek Yesilada,Patrick Montgomery,Laurent Le Cam,Catherine Martinelli Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（2007）
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design,lithography,OPC,DFM,32nm
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