Application of Phase Shift Focus Monitor in EUVL Process Control

Lei Sun,Sudhar Raghunathan,Vibhu Jindal,Eric Gullikson,Pawitter Mangat,Iacopo Mochi, Kenneth A. Goldberg,Markus P. Benk,Oleg Kritsun,Tom Wallow,Deniz Civay,Obert Wood

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（2013）

引用 8|浏览28
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关键词
phase shift mask,Extreme ultraviolet lithography,EUV,focus monitor,lithography
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