Evaluation of a New Metrology Technique to Support the Needs of Accuracy, Precision, Speed, and Sophistication in Near-Future Lithography

Chih-Ming Ke,Jimmy Hu,Willie Wang,Jacky Huang,H. L. Chung,C. R. Liang,Victor Shih,H. H. Liu,H. J. Lee,John Lin,Y. D. Fan,Kaustuve Bhattacharyya,Maurits van der Schaar,Noelle Wright,Kiwi Yuan,Vivien Wang,Cathy Wang,Spencer Lin,Mir Shahrjerdy,Andreas Fuchs,Karel van der Mast

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（2009）

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