Evaluation of Most Recent Chemically Amplified Resists for High Resolution Direct Write Using A Leica Sb350 Variable Shaped Beam Writer

Anatol Schwersenz,Dirk Beyer,Monika Boettcher,Kang-Hoon Choi,Ulrich Denker,Christoph Hohle,Mathias Irmscher,Frank-Michael Kamm,Karl-Heinz Kliem,Johannes Kretz,Holger Sailer,Frank Thrum

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（2006）

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关键词
chemically amplified resist,variable-shaped beam,e-beam direct writing
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