Overview Of Scalpel Mask Technology

Gr Bogart,Ae Novembre, A Kornblit,Ml Peabody,Rc Farrow,Mi Blakey,Rj Kasica,Ja Liddle,T Saunders,Cs Knurek

15TH EUROPEAN CONFERENCE ON MASK TECHNOLOGY FOR INTEGRATED CIRCUITS AND MICROCOMPONENTS '98（1999）

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摘要

Scattering with angular limitation projection electron beam lithography is a true 4X reduction technology that capitalizes on high resolution capabilities from electron beam exposure and high throughput capability from projection.

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关键词

high throughput,electron beam,scattering,high resolution,electron beam lithography

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