Inductively Coupled Plasma Etching of III-Nitrides in Cl 2 /Xe, Cl 2 /Ar and Cl 2 /HeHyun Cho,Y.B. Hahn,D.C. Hays,K.B. Jung,S.M. Donovan,C.R. Abernathy,S.J. Pearton,R.J. ShulMRS Proceedings（2020）引用 17|浏览12暂无评分关键词inductive coupled plasma,nitrogen,noble gasesAI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
