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Investigation Of Electron Cyclotron Resonance Chemical Vapor Deposition Process For A-Si:H Deposition, Film Characterization And In Situ Plasma Diagnostics

L. C. Hu, C. J. Wang,Y. W. Lin,T. C. Wei,C. C. Lee,J. Y. Chang,I. C. Chen,Y. Kawai,T. T. Li

ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY（2015）

Cited 7|Views14
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Key words
Low Temperature Plasmas,Atomic Layer Deposition,Thin-Film Transistors,Plasma Etching,Nanoparticle Enhanced Absorption
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