CHEMICAL VAPOR DEPOSITION OF HIGH CONDUCTIVITY, ADHERENT THIN FILMS OF RUTHENIUMBryan C Hendrix,James J Welch,Steven M Bilodeau,Jeffrey F Roeder,Chongying Xu,Thomas H Baummag(2011)引用 29|浏览10暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要