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Reliability Issues Related to Fast Charge Loss Mechanism in Embedded Non Volatile Memories

2006 IEEE INTERNATIONAL INTEGRATED RELIABILITY WORKSHOP, FINAL REPORT(2006)

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Abstract
In this work, we report on a thorough study of charge loss in embedded non volatile memories. We focused on the fast initial threshold voltage (Vth) shift, which occurs during the first minutes of data retention bake. Experiments were performed to have a better understanding of this phenomenon. As a result, we can predict the Vth shift of a cell baked at 250degC and evaluate its impact on product reliability. This is the first time that this reliability aspect is characterized with such a level of accuracy. Based on these observations, a physical model is proposed to describe the fast initial threshold voltage shift
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Key words
random-access storage,semiconductor device reliability,250 C,embedded non volatile memories,fast charge loss mechanism,fast initial threshold voltage shift,product reliability,reliability issues
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