Improving on-product performance at litho using integrated diffraction-based metrology and computationally designed device-like targets fit for advanced technologies (incl. FinFET)

G T Huang, K S Chen, C W Hsieh, Y C Chen,C M Ke,T S Gau, Y C Ku,Kaustuve Bhattacharyya,John Huang,Arie Den Boef,Maurits Van Der Schaar, Martijn Maassen, Reinder Plug,Youping Zhang,Steffen Meyer, Martijn Van Veen,Chris De Ruiter,Jon Wu,Hua Xu,Tatung Chow, Charles Chen,Eric Verhoeven, Pu Li,Paul Hinnen,Greet Storms, Kelvin Pao, Gary Zhang,Christophe Fouquet, Takuya Mori

Proceedings of SPIE（2014）

引用 17|浏览4

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Overlay,focus,in-die,integrated,in-line,on-product,diffraction,scatterometer,TMU,matching,metrology,process robustness,matching to device,target design,productivity,track,MA time,High-volume manufacturing,HVM

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