Periodical Nanostructure Fabrication Using Electron Interference Fringes Produced by Scanning Interference Electron Microscope

A scanning interference electron microscope (SIEM) has been developed for periodical nanostructure fabrication. This system can produce electron interference fringes with a period from 2 nm to several tens of micrometers. Fabrications of periodical nanostructures with 23 to 170 nm periods have been demonstrated by transferring the electron interference fringe onto the semiconductor surfaces.