Investigation of Strain Relaxation Mechanisms and Transport Properties in Epitaxial Smnio3 Films
Journal of applied physics(2008)
摘要
This article deals with strain relaxation in SmNiO3 epitaxial films deposited by chemical vapor deposition on SrTiO3 substrates. Thanks to x-ray reciprocal space mapping, we demonstrate that the strain relaxation is driven both “chemically” and “mechanically” by the formation of oxygen vacancies and misfit dislocations, respectively. Besides, a careful interpretation of the resistivity measurements allows us to highlight a correlation between the formation of oxygen vacancies, the stabilization of Ni3+, and the metal-insulator transition in the SmNiO3 films. Furthermore, using coplanar and grazing incidence diffraction, the shape of the strain gradient within the films is retrieved. This latter is calculated using a versatile scattering model involving B-spline functions. Finally, particular planar faults (Ruddlesden–Popper faults) that give rise to extended diffuse scattering on transverse scans are analyzed using a recent phenomenological model.
更多查看译文
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要