High-Order Aberration Measurement Technique Based on A Quadratic Zernike Model with Optimized Source

Jishuo Yang,Xiangzhao Wang,Sikun Li,Lifeng Duan,Guanyong Yan,Dongbo Xu,Anatoly Y. Bourov,Andreas Erdmann

Optical engineering（2013）

引用 9|浏览24
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关键词
aberration measurement,quadratic Zernike model,aerial image,principal component analysis,microlithography
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