Patterning-induced Strain Relief in Single Lithographic SiGe Nanostructures Studied by Nanobeam X-Ray DiffractionD. Chrastina,G. M. Vanacore,M. Bollani,P. Boye,S. Schoeder,M. Burghammer,R. Sordan,G. Isella,M. Zani,A. TagliaferriNanotechnology(2012)引用 23|浏览17暂无评分关键词NanotribologyAI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要