OPC Structures for Maskshops Qualification for the CMOS65nm and CMOS45nm Nodes
Frank Sundermann,Yorick Trouiller,Jean-Christophe Urbani,Christophe Couderc,Jerome Belledent,Amandine Borjon,Franck Foussadier,Christian Gardin,Laurent LeCam,Yves Rody,Mazen Saied,Emek Yesilada,Catherine Martinelli, Bill Wilkinson,Florent Vautrin,Nicolo Morgana,Frederic Robert,Patrick Montgomery,Gurwan Kerrien,Jonathan Planchot,Vincent Farys, Jean-Luc Di Maria Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（2007）
关键词
65 nm node,45nm node,OPC structures,Reticle CD metrology,PEC,short range CD uniformity
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