Challenges in 65nm Poly, RX and STI Defect Learning

Chienfan Yu,Javier Ayala,Cung Tran,James Gay,Anthony Santiago,Eric Meyette, Elizabeth Hampton,Garrett Oakley,Kenneth Bandy,Timothy McCormack,Rajasekhar Venigalla, Frederick Scholl

ASMC proceedings（2008）

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inspection,masks,semiconductor device manufacture,RX,STI defect learning,electrical kerf test,front end of line defect pareto,integration scheme,key yield detractors,micromasking,optical in-line inspection

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