GST CMP challenges & solutions for 45nm PCRAM

Li Jiang,Feng Chen,PuLei Zhu,Mingqi Li,Hongtao Liu,Guanping Wu,Ming Zhong,AoDong He

ECS Transactions（2013）

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摘要

We report on GST(Ge2Sb2Te5) CMP process challenges and solutions in this paper. GST stain issue is solved through proper polish pad selection, process scheme and cleaning step optimization. The key factors to achieve minimum oxide loss are slurry dilution ratio & H2O2 concentration optimization and over polish control. Pico-second laser acoustics type measurement tool proves suitable for GST CMP process inline and offline monitor

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