Temperature Dependence of Chemical States and Band Alignments in Ultrathin HfOxNy/Si Gate StacksX. J. Wang,M. Liu,L. D. ZhangJournal of physics D, Applied physics（2012）引用 2|浏览20暂无评分AI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
