Firing Condition for Entire Reactions of Fluorides with Water Vapor in Metalorganic Deposition Method Using Trifluoroacetate

To obtain the YBa2Cu3O7−x (YBCO) film on buffered metal tapes, we have to fire films below 800°C and avoid formation of BaF2 in the films which leads to low Jc by metalorganic deposition using trifluoroacetate method. By estimating each process condition to reaction rate of fluorides with water vapor in precursor, we can established firing profile for YBCO film on buffered metal substrate at 725°C. With the profile, we can successfully obtained YBCO film on CeO2/YSZ/hastelloy, which has critical current density (Jc) of 1.72 MA/cm2 (77 K, 0 T) and thickness of 1860 Å.