A novel use of rf-GD sputtering for sample surface preparation for SEM: its impact on surface analysis
EMC 2008 14th European Microscopy Congress 1–5 September 2008, Aachen, Germany(2008)
摘要
Through recent advances in ultra-high resolution FE-SEM with novel electron optics and multi-detection systems [1], where
SEs, high angle BSEs and channeling BSEs are detected separately, the world of practical surface analysis may be changed drastically.
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关键词
SEM, sample preparation, rf-GD sputtering
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