Effects of the electrochemical deposition conditions on the properties of ZnO polycrystalline thin film

Effects of the electrochemical deposition conditions on the properties of ZnO polycrystalline thin film were investigated, including the applied voltages, the deposition time and annealing treatment. X-ray diffraction and atomic force microscope measurements were performed to characterize the ZnO films. The results showed that the films were polycrystalline with hexagonal wurtzite-type structure and presented different morphologies, grain size ranging approximately from 180 to 320nm. ZnO films obtained at −0.9 and −1.0V were compact and homogeneous, and the transmittance was close to 95% at the wavelength of 500nm.