Adsorption Configuration of Pyrrole (c4h4nh) on Si(100)-2 X 1 by Using Pes and Angle Resolved Nexafs
Journal of electron spectroscopy and related phenomena(2005)
摘要
The chemical and geometrical characteristics of pyrrole on Si(1 0 0)-2 x 1 were studied by using the photoemission spectroscopy (PES) and the near edge X-ray absorption fine structure (NEXAFS). A pyrrole layer was formed by exposing 20 L pyrrole molecules on the Si(1 0 0)-2 x 1 surface at 300 K. PES results confirmed that pyrrole reacts with the surface through the breakage of N-H and C-H groups, forming Si-N bonds and Si-C bonds between the Si surface and the pyrrole ring. NEXAFS studies showed that pi-bonding state of pyrrole has angle dependence with respect to the surface normal. Thus, pyrrole was dissociatively adsorbed by [2 + 2] cycloaddition reaction with similar to 16.5 degrees tilt angle with respect to the surface normal direction at 300 K. (c) 2005 Published by Elsevier B.V.
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关键词
photoemission spectroscopy,pyrrole,NEXAFS,Si(100)
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