High Power 0.25 [micro Sign]m Gate GaN HEMTs on Sapphire with Power Density 4.2 W∕mm at 10 GHz

Electronics letters(2003)

引用 14|浏览21
暂无评分
摘要
Metal organic chemical vapour deposition-grown AlGaN/GaN high electron mobility transistors (HEMTs) with power density up to 4.2 W/mm, one of the highest values ever reported for 0.25 mum gate-length AlGaN/GaN HEMTs, were fabricated on sapphire 2 substrates. The devices exhibited maximum drain current density as high as 1370 mA/mm high transconductance up to 223 mS/mm. short-circuit current gain cutoff frequency of (f(T)) 67 GHz, and maximum frequency of oscillation (f(max)) of 102 GHz.
更多
查看译文
关键词
aluminium compounds,gallium compounds,III-V semiconductors,wide band gap semiconductors,power HEMT,MOCVD,vapour phase epitaxial growth,sapphire,substrates,microwave field effect transistors,microwave power transistors
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要