Analysis of pattern-dependent image placement of single-membrane stencil masks for electron-beam lithography
Microelectronic Engineering（2007）
关键词
crystal anisotropy,previous experiment,si membrane,ip correction scheme,large membrane,eb data,simulation result,large image placement,membrane distortion,electron-beam lithography,large single-membrane stencil mask,pattern-dependent image placement,finite element method,electron beam lithography,anisotropy
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