Teramoto, Y. - Extreme Ultraviolet Lithography Syst Dev Assoc EU, Gotemba R&D Ctr

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个人简介

Yusuke Teramoto (A'02) was born in Kumamoto, Japan, on November 30, 1975. He received the B.S., M.S., and Ph.D. degrees from Kumamoto University, Kumamoto, Japan, in 1998, 2000, and 2002, respectively. He is currently with the Extreme Ultraviolet Lithography System Development Association, Shizuoka, Japan.

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LDP EUV Source Performance and Cost-of-ownership Improvement

Yusuke Teramoto, Shunichi Morimoto, Teruaki Kawajiri, Koji Suzuki, Fuki Sato, Akihisa Nagano, Noritaka Ashizawa,Hidenori Watanabe,Kazuya Aoki,Yoshihiko Sato

International Conference on Extreme Ultraviolet Lithography 2024 (2024)

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High-brightness LDP Source