Yohann Spiegel - Ion Beam Services (ibs)

基本信息

浏览量：15

职业迁徙

个人简介

Yohann Spiegel received the Material Engineering degree from Ecole supérieure d'Ingénieurs de Luminy (ESIL) in 2008. He is with Ion Beam Services, Peynier, France, as an Application Engineer.

研究兴趣

论文共 31 篇作者统计合作学者相似作者

按年份排序按引用量排序主题筛选期刊级别筛选合作者筛选合作机构筛选

Locally Ion Implantation and Annealing Effects in Diamond

Karine Isoird, Josianne Tasselli,Yohann Spiegel, Raid Gourad,Fuccio Cristiano,Marie-Amandine Pinault-Thaury,Grégory Grosset, Rém Gilet, F. Jomard

HAL (Le Centre pour la Communication Scientifique Directe) (2023)

引用0浏览0引用

A Laser‐Processed Silicon Solar Cell with Photovoltaic Efficiency in the Infrared

Maria Isabel Sanchez,Philippe Delaporte,Yohann Spiegel,Ben Franta,Eric Mazur,Thierry Sarnet

Physica status solidi A, Applications and materials science（2021）

引用11浏览0引用

Exploration of Solid Phase Epitaxy of 3C-Sic on Silicon

Marcin Zielinski,Sylvain Monnoye,Hugues Mank,Frank Torregrosa,Gregory Grosset,Yohann Spiegel,Marc Portail,Adrien Michon

Materials Science Forum (2020): 132-138

引用0浏览0引用

Phase evolution of ultra-thin Ni silicide films on CF₄ plasma immersion ion implanted Si

Lan-Tian Zhao,Mingshan Liu,Qing-Hua Ren,Chen-He Liu,Qiang Liu,Ling-Li Chen,Yohann Spiegel,Frank Torregrosa,Wenjie Yu,Qing-Tai Zhao

Nanotechnologyno. 20 (2020)

引用0浏览0引用

Phase evolution of ultra-thin Ni silicide films on CF4 plasma immersion ion implanted Si

Lan-Tian Zhao,Mingshan Liu,Qing-Hua Ren,Chen-He Liu,Qiang Liu,Ling-Li Chen,Yohann Spiegel,Frank Torregrosa,Wenjie Yu,Qing-Tai Zhao

NANOTECHNOLOGY（2020）

引用2浏览0WOS引用

Novel Carbon Treatment to Create an Oriented 3C-Sic Seed on Silicon

Marcin Zielinski,Sylvain Monnoye,Hugues Mank,Frank Torregrosa,Gregory Grosset,Yohann Spiegel

Materials science forum (2019): 153-156

引用0浏览0引用

Advantages and Challenges of Plasma Immersion Ion Implantation for Power Devices Manufacturing on Si, SiC and GaN Using PULSION® Tool

Frank Torregrosa,Yohann Spiegel,Laurent Roux,Guillaume Sempere,Gael Borvon,Thomas Wuebben,Werner Schustereder,Moriz Jelinek,Frederic Morancho,Philippe Godignon,Marcin Zielinski

2018 22nd International Conference on Ion Implantation Technology (IIT)pp.33-37, (2018)

引用2浏览0EIWOS引用

Simulation of 3D Doping by Plasma Immersion Ion Implantation for FinFET or deep Trench Doping Applications. Effect of main Process Parameters and Study of Wall Doping Non-Uniformity as Function of Form Factor and Device Scaling

Frank Torregrosa, Benjamin Roux, Mona Ebrish,Oleg Gluschenkov,Yohann Spiegel, A. Filip Petrescu,Vinay Pai,Spyridon Skordas,Hemanth Jagannathan

2018 22nd International Conference on Ion Implantation Technology (IIT)pp.259-262, (2018)

引用0浏览0EIWOS引用

A Hybrid Implant Doping Technique with Plasma Immersion Ion Implant (PIII) Process for 10 Nm Fin Cannel of 3D-FET

Yi-Ju Chen,Ying-Tsan Tang,Chang-Hsien Lin,Chun-Chi Chen,Julian Duchaine,Yohann Spiegel, Frank Torregrossa,Laurent Roux, Jason Chen, Yun-Jie Wei,Yao-Ming Huang, Min-Chuan Hsiao, Yen-Chang Chen,Kai-Shin Li,Yao-Jen Lee,Min-Cheng Chen,Jia-Ming Shieh,Wen-Kuan Yeh

2016 21st International Conference on Ion Implantation Technology (IIT) (2016)

引用0浏览0引用

Efficient and low-damage nitrogen doping of graphene via plasma-based methods

Yu-Pu Lin,Younal Ksari,Dominique Aubel,Samar Hajjar-Garreau,Gaël Borvon,Yohann Spiegel,Laurent Roux,Laurent Simon,Jean-Marc Themlin

Carbon（2016）

引用22浏览0引用

加载更多

作者统计

合作学者

合作机构

D-Core

合作者
学生
导师

暂无相似学者，你可以通过学者研究领域进行搜索筛选

数据免责声明

页面数据均来自互联网公开来源、合作出版商和通过AI技术自动分析结果，我们不对页面数据的有效性、准确性、正确性、可靠性、完整性和及时性做出任何承诺和保证。若有疑问，可以通过电子邮件方式联系我们：report@aminer.cn