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Research Interests

Papers共 12 篇Author StatisticsCo-AuthorSimilar Experts

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Ferroelectric Gate Stack Engineering with Tunnel Dielectric Insert for Achieving High MemoryWindow in FEFETs for NAND Applications
Dipjyoti Das, Hyeonwoo Park, Zekai Wang, Chengyang Zhang,Prasanna Venkatesan Rayindran,Chinsung Park,Nashrah Afroze,Po-Kai Hsu,Mengkun Tian,Hang Chen, Winston Chem,Suhwan Lim, Kwangsoo Kim,Kijoon Kim,Wanki Kim,Daewon Ha,Shimeng Yu,Suman Dutta,Asif Khan
8TH IEEE ELECTRON DEVICES TECHNOLOGY & MANUFACTURING CONFERENCE, EDTM 2024pp.708-710, (2024)
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#Papers: 12

#Citation: 0

H-Index: 0

G-Index: 0

Sociability: 4

Diversity: 0

Activity: 2

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