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Papers共 19 篇Author StatisticsCo-AuthorSimilar Experts
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OPTICAL AND EUV NANOLITHOGRAPHY XXXV (2022)
Xinghua Sun,Yann Mignot,Christopher Cole,Eric Liu, Daniel Santos, Angelique Raley,Jennifer Church,Luciana Meli,Stuart A. Sieg,Peter Biolsi
Metrology, Inspection, and Process Control XXXVI (2022)
Eric R. Miller,Indira Seshadri, Tsung-Sheng Kang,Dominik Metzler, Joe Lee,Stuart Sieg,Sebastian U. Engelmann, Jeff Shearer,John Arnold,Nelson Felix
Advanced Etch Technology and Process Integration for Nanopatterning XI (2022)
Extreme Ultraviolet (EUV) Lithography XII (2021)
Indira Seshadri,Jennifer Church, Prateek Hundekar,Mary Breton,Jingyun Zhang,Eric Miller,Andrew Greene,Julien Frougier, Chris Waskiewicz,Tao Li, Tsung-Sheng Kang, Daniel Dechene,Carl Radens,Stuart Sieg,Veeraraghavan Basker,Nelson Felix,Chris A. Mack
Extreme Ultraviolet (EUV) Lithography XII (2021)
Design-Process-Technology Co-optimization for Manufacturability XIV (2020)
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY XI (2020)
ECS Meeting Abstractsno. 31 (2018): 1075-1075
Chi-Chun Liu,Elliott Franke,Yann Mignot, Scott LeFevre,Stuart A. Sieg,Cheng Chi,Luciana Meli,Doni Parnell,Kristin Schmidt,Martha I. Sanchez,Lovejeet Singh,Tsuyoshi Furukawa,Indira Seshadri, Ekmini A. De Silva,Hsinyu Tsai,Kafai Lai,Hoa Truong,Richard Farrell,Robert L. Bruce,Mark Somervell,Daniel P. Sanders,Nelson Felix,John C. Arnold,David Hetzer,Akiteru Ko,Andrew Metz,Matthew E. Colburn,Daniel Corliss
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Author Statistics
#Papers: 19
#Citation: 62
H-Index: 4
G-Index: 7
Sociability: 5
Diversity: 1
Activity: 0
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