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Papers共 20 篇Author StatisticsCo-AuthorSimilar Experts
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Ruilong Xie, Wonhyuk Hong, Chen Zhang, Jongjin Lee,Kevin Brew, Richard Johnson,Nicholas A. Lanzillo,Hosadurga Shobha, Taesun Kim, Panjae Park,Shogo Mochizuki,Iqbal Saraf,Chanro Park, Lei Zhuang, Clifford Osborn, Wai Kin Li, Feng Liu,Muthumanickam Sankarapandian, Chung Ju Yang, Juntao Li, Lukas Tierney,Ruturaj Pujari,Yasir Sulehria, Yuncheng Song, Huimei Zhou, Miaomiao Wang,Michael Belyansky, Somnath Ghosh, Haojun Zhang,Koichi Motoyama, Debarghya Sarkar, Wukang Kim, Albert Chu, Tao Li,Fabio Carta, Oleg Gluschenkov, Joongsuk Oh, Matthew Malley, Pinlei Chu, Son Nguyen, Katherine Luedders,Joe Lee, Shahrukh Khan, Prabudhya Roy Chowdhury, Huai Huang, Abir Shadman,Stuart Sieg, Daniel Dechene,Daniel Edelstein, John Arnold,Tenko Yamashita,Kisik Choi,Kang-ill Seo, Dechao Guo,Huiming Bu
Symposium on VLSI Technologypp.1-2, (2024)
OPTICAL AND EUV NANOLITHOGRAPHY XXXV (2022)
Xinghua Sun,Yann Mignot,Christopher Cole,Eric Liu, Daniel Santos, Angelique Raley,Jennifer Church,Luciana Meli,Stuart A. Sieg,Peter Biolsi
Metrology, Inspection, and Process Control XXXVI (2022)
Advanced Etch Technology and Process Integration for Nanopatterning XI (2022)
Extreme Ultraviolet (EUV) Lithography XII (2021)
Indira Seshadri,Jennifer Church, Prateek Hundekar,Mary Breton,Jingyun Zhang,Eric Miller,Andrew Greene,Julien Frougier, Chris Waskiewicz,Tao Li,Tsung-Sheng Kang, Daniel Dechene,Carl Radens,Stuart Sieg,Veeraraghavan Basker,Nelson Felix,Chris A. Mack
Extreme Ultraviolet (EUV) Lithography XII (2021)
Design-Process-Technology Co-optimization for Manufacturability XIV (2020)
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY XI (2020)
ECS Meeting Abstractsno. 31 (2018): 1075-1075
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Author Statistics
#Papers: 20
#Citation: 61
H-Index: 4
G-Index: 7
Sociability: 5
Diversity: 1
Activity: 0
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