Marcus van de Kerkhof - ASML | 人才画像

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EUV-induced plasma; Defectivity; Particle Contamination Control; Plasma-material interactions; Plasma-facing materials; EUV sensors; Wavefront sensing; EUV optics

研究兴趣

论文共 46 篇作者统计合作学者相似作者

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Charging and Mobilization of Dust Particles on a Surface in Plasma

José H Pagán Muñoz, Xu Wang,Mihály Horányi,Vladimir Kvon,Luuk Heijmans,Manis Chaudhuri,Mark van de Kerkhof,Andrei M Yakunin,Pavel Krainov,Dmitry Astakhov

Physical review lettersno. 11 (2024): 115301-115301

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Exploring the Limits of High Contrast Contact Imaging Using Split Pupil Exposures in High-Na EUV Lithography

Andreas Erdmann,Hazem Mesilhy,Peter Evanschitzky,Gerardo Bottiglieri,Tim Brunner,Eelco van Setten,Claire van Lare,Mark van de Kerkhof

OPTICAL AND EUV NANOLITHOGRAPHY XXXVII (2024)

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Advanced EUV Patterning of 2D TMDs for CMOS Integration

Vina Faramarzi,Etienne de Poortere, Syam Parayil Venugopalan, Pieter Woltgens,Youngtag Woo,Mark van de Kerkhof, Pawan Kumar,Henry Medina Silva,Pierre Morin,Inge Asselberghs,Chelsey Dorow,Kevin O'Brien,Kirby Maxey,Uygar Avci

NOVEL PATTERNING TECHNOLOGIES 2024 (2024)

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Particle Mobilization by EUV-induced Plasma and Fast Electrons

Mark van de Kerkhof, Dmitry Shefer,Andrey Nikipelov, Fabio Sbrizzai,Vladimir Kvon, Sim Bouwmans,Job Beckers,Vadim Banine

OPTICAL AND EUV NANOLITHOGRAPHY XXXVII (2024)

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Validation of imaging benefits of Dual Monopole exposures

Timothy A. Brunner,Joern-Holger Franke,Vincent Truffert,Peter De Bisschop,Gijsbert Rispens, Edouard Duriau,Andre van Dijk,Cyrus Tabery,David Rio,Etienne de Poortere,Mark van de Kerkhof,Eric Hendrickx

INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2023 (2023)

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Physics and Applications of Dusty Plasmas: the Perspectives 2023

J. Beckers,J. Berndt,D. Block,M. Bonitz,P. J. Bruggeman, L. Coueedel,G. L. Delzanno, Y. Feng, R. Gopalakrishnan,F. Greiner,P. Hartmann, M. Horanyi,H. Kersten,C. A. Knapek,U. Konopka,U. Kortshagen,E. G. Kostadinova,E. Kovacevic,S. I. Krasheninnikov, I. Mann,D. Mariotti,L. S. Matthews, A. Melzer,M. Mikikian,V. Nosenko,M. Y. Pustylnik,S. Ratynskaia,R. M. Sankaran,V. Schneider, E. J. Thimsen,E. Thomas,H. M. Thomas,P. Tolias,M. van de Kerkhof

PHYSICS OF PLASMASno. 12 (2023)

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Laser Light Scattering (LLS) to Observe Plasma Impact on the Adhesion of Micrometer-Sized Particles to a Surface

D. Shefer,A. Nikipelov,M. van de Kerkhof,V Banine,J. Beckers

JOURNAL OF PHYSICS D-APPLIED PHYSICS（2023）

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The Impact of Hydrogen Plasma on the Structure and Morphology of Tin and Lead Micrometer Sized Particles

D. Shefer,A. Nikipelov,M. van de Kerkhof,Z. Marvi,V Banine,J. Beckers

JOURNAL OF PHYSICS D-APPLIED PHYSICS（2023）

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Particle Charging During Pulsed EUV Exposures with Afterglow Effect

M. Chaudhuri,L. C. J. Heijmans,M. van de Kerkhof,P. Krainov,D. Astakhov,A. M. Yakunin

Plasma Sources Science and Technologyno. 9 (2023): 095005-095005

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EUV Mask Absorber Induced Best Focus Shifts

Hazem Mesilhy,Peter Evanschitzky,Gerardo Bottiglieri,Eelco van Setten,Claire van Lare,Tim Brunner,Mark van de Kerkhof,Andreas Erdmann

Optical and EUV Nanolithography XXXV (2022)

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