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个人简介
Kevin Brew received the Ph.D. degree (Hons.) in chemical engineering from Purdue University, West Lafayette, IN, USA, in 2015, and the B.ChE. degree (summa cum laude) from the University of Delaware, Newark, DE, USA, in 2010. In 2020, he was first appointed as an IBM Master Inventor and re-appointed in 2023. He has more than ten years of research and development experience spans across materials and device research fields, including catalysis, photolithography, photovoltaics, and most notably analog memristors, including PCM, RRAM, and ECRAM. He is currently a Researcher with IBM Semiconductors, Albany, NY, USA. He has authored or coauthored over 100 patents and publications. His current research interests include advanced semiconductor node contact engineering and materials research and development for chiplets.
研究兴趣
论文共 46 篇作者统计合作学者相似作者
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Fabia Farlin Athena,Omobayode Fagbohungbe,Nanbo Gong,Malte J. Rasch, Jimmy Penaloza,Sooncheon Seo,Arthur Gasasira,Paul Solomon,Valeria Bragaglia,Steven Consiglio,Hisashi Higuchi,Chanro Park,Kevin Brew,Paul Jamison,Christopher Catano,Iqbal Saraf, Claire Silvestre, Xuefeng Liu, Babar Khan, Nikhil Jain,Steven Mcdermott, Rick Johnson,I. Estrada-Raygoza,Juntao Li,Tayfun Gokmen,Ning Li,Ruturaj Pujari,Fabio Carta,Hiroyuki Miyazoe,Martin M. Frank,Antonio La Porta,Devi Koty,Qingyun Yang,Robert D. Clark,Kandabara Tapily,Cory Wajda,Aelan Mosden, Jeff Shearer,Andrew Metz,Sean Teehan,Nicole Saulnier,Bert Offrein, Takaaki Tsunomura,Gert Leusink,Vijay Narayanan,Takashi Ando
FRONTIERS IN ELECTRONICS (2024)
Ruilong Xie, Wonhyuk Hong, Chen Zhang, Jongjin Lee,Kevin Brew, Richard Johnson,Nicholas A. Lanzillo,Hosadurga Shobha, Taesun Kim, Panjae Park,Shogo Mochizuki,Iqbal Saraf,Chanro Park, Lei Zhuang, Clifford Osborn, Wai Kin Li, Feng Liu,Muthumanickam Sankarapandian, Chung Ju Yang, Juntao Li, Lukas Tierney,Ruturaj Pujari,Yasir Sulehria, Yuncheng Song, Huimei Zhou, Miaomiao Wang,Michael Belyansky, Somnath Ghosh, Haojun Zhang,Koichi Motoyama, Debarghya Sarkar, Wukang Kim, Albert Chu, Tao Li,Fabio Carta, Oleg Gluschenkov, Joongsuk Oh, Matthew Malley, Pinlei Chu, Son Nguyen, Katherine Luedders,Joe Lee, Shahrukh Khan, Prabudhya Roy Chowdhury, Huai Huang, Abir Shadman,Stuart Sieg, Daniel Dechene,Daniel Edelstein, John Arnold,Tenko Yamashita,Kisik Choi,Kang-ill Seo, Dechao Guo,Huiming Bu
Symposium on VLSI Technologypp.1-2, (2024)
2023 21st International Workshop on Junction Technology (IWJT)pp.1-4, (2023)
S. Ambrogio,P. Narayanan,A. Okazaki, A. Fasoli,C. Mackin,K. Hosokawa,A. Nomura, T. Yasuda,A. Chen,A. Friz,M. Ishii, J. Luquin,Y. Kohda,N. Saulnier,K. Brew,S. Choi, I. Ok,T. Philip,V. Chan,C. Silvestre,I. Ahsan,V. Narayanan,H. Tsai,G. W. Burr
Natureno. 7975 (2023): 768-775
IEEE Transactions on Electron Devicesno. 7 (2023): 3511-3516
Manuel Le Gallo,Riduan Khaddam-Aljameh,Milos Stanisavljevic,Athanasios Vasilopoulos,Benedikt Kersting,Martino Dazzi,Geethan Karunaratne,Matthias Brändli,Abhairaj Singh,Silvia M. Müller,Julian Büchel,Xavier Timoneda,Vinay Joshi,Malte J. Rasch,Urs Egger,Angelo Garofalo,Anastasios Petropoulos,Theodore Antonakopoulos,Kevin Brew,Samuel Choi,Injo Ok,Timothy Philip,Victor Chan, Claire Silvestre,Ishtiaq Ahsan,Nicole Saulnier,Vijay Narayanan,Pier Andrea Francese,Evangelos Eleftheriou,Abu Sebastian
Nature Electronicsno. 9 (2023): 680-693
2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)pp.1-4, (2023)
IEEE Transactions on Semiconductor Manufacturingno. 3 (2023): 327-331
Geoffrey W. Burr,Pritish Narayanan,Stefano Ambrogio,Atsuya Okazaki,Hsinyu Tsai,Kohji Hosokawa,Charles Mackin,Akiyo Nomura,Takeo Yasuda,J. Demarest,Kevin Brew,V. Chan,S. Choi,T. Gordon,T. M. Levin,Alexander M. Friz,Masatoshi Ishii,Yasuteru Kohda,An Chen,Andrea Fasoli,Jose Luquin,Nicole Saulnier,S. Teehan,Ishtiaq Ahsan,Vijay Narayanan
VLSI Technology and Circuitspp.1-2, (2023)
G. S. Syed,K. Brew,A. Vasilopoulos,V. P. Jonnalagadda,B. Kersting,T. Philip,V. Bragaglia,S. Ambrogio,J. Büchel, J. Giannopoulos,M. Le Gallo,C.-W. Cheng,M. BrightSky,V. Narayanan,N. Saulnier,A. Sebastian
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作者统计
#Papers: 46
#Citation: 416
H-Index: 11
G-Index: 20
Sociability: 6
Diversity: 2
Activity: 40
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