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Research Interests

Papers共 12 篇Author StatisticsCo-AuthorSimilar Experts

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Critical Process Features Enabling Aggressive Contacted Gate Pitch Scaling for 3nm CMOS Technology and Beyond
Chih-Hao Chang,V. S. Chang,K. H. Pan, K. T. Lai, J. H. Lu, J. A. Ng,C. Y. Chen,B. F. Wu, C. J. Lin, C. S. Liang,C. P. Tsao, Y. S. Mor, C. T. Li, T. C. Lin,C. H. Hsieh,P. N. Chen, H. H. Hsu,J. H. Chen,H. F. Chen,J. Y. Yeh,M. C. Chiang,C. Y. Lin,J. J. Liaw,C. H. Wang, S. B. Lee,C. C. Chen,H. J. Lin,R. Chen, K. W. Chen,C. O. Chui,Y. C. Yeo,K. B. Huang,T. L. Lee,M. H. Tsai,K. S. Chen, Y. C. Lu,S. M. Jang, S. -Y. Wu
2022 International Electron Devices Meeting (IEDM) (2022)
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