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个人简介
J. P. Singh received the Ph.D. degree from the Inter-University Accelerator Centre (IUAC), India, where he developed a UHV-STM system attached to the 15 MV accelerator beamline. He completed his postdoctoral research with the Rensselaer Polytechnic Institute, NY, USA. He is a Professor with the Department of Physics, Indian Institute of Technology Delhi, India. He has excellent experience in the area of nanostructure and thin film fabrication using glancing angle deposition. He has published more than 110 research articles in international journals and has two patents. He received several awards, including the Outstanding Young Faculty Award from IIT Delhi and the Fellow Medal from the International Association of Advance Material (IAAM).
研究兴趣
论文共 123 篇作者统计合作学者相似作者
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FRONTIERS OF MATERIALS SCIENCEno. 1 (2024)
ACS APPLIED MATERIALS & INTERFACESno. 31 (2024): 40914-40926
International Journal of Hydrogen Energy (2024): 826-838
ACS APPLIED NANO MATERIALSno. 7 (2024): 6736-6748
JOURNAL OF POLYMER RESEARCHno. 6 (2024)
JOURNAL OF ALLOYS AND COMPOUNDS (2024)
SURFACES AND INTERFACES (2024)
ACS APPLIED MATERIALS & INTERFACESno. 33 (2024): 44193-44201
Materials science in semiconductor processing (2024): 108712-108712
ACS applied nano materialsno. 11 (2023): 9236-9246
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作者统计
#Papers: 127
#Citation: 2672
H-Index: 30
G-Index: 47
Sociability: 5
Diversity: 3
Activity: 83
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