Haruki Yokoyama

Haruki Yokoyama was born in Kochi, Japan, on March 7, 1965. He received the B.S. and M.S. degrees in electrical engineering from Hiroshima University, Hiroshima, Japan, in 1987 and 1989, respectively, and the Ph.D. degree in applied physics from Tohoku University, Sendai, Japan, in 1996. In 1989, he joined the Nippon Telegraph and Telephone (NTT) LSI Laboratories, Kanagawa, Japan. Since 1989, he has been involved in research and development work on the epitaxial growth technologies of III–V compound semiconductors using metal–organic vapor phase epitaxy. He is currently with the NTT Device Technology Laboratories, Kanagawa. Dr. Yokoyama is a Member of the Japan Society of Applied Physics.