Hao Tang - Peking University, Peking University

基本信息

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职业迁徙

个人简介

Hao Tang received the PhD degree in computer science from Peking University, in 2019. He has won the 2015 MSRA fellowship. His research interests include static analysis and defect prediction.

研究兴趣

论文共 18 篇作者统计合作学者相似作者

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Schottky Barrier Heights in Two-Dimensional Field-Effect Transistors: from Theory to Experiment

Yangyang Wang, Shiqi Liu, Qiuhui Li,Ruge Quhe,Chen Yang,Ying Guo, Xiuying Zhang,Yuanyuan Pan,Jingzhen Li,Han Zhang,Lin Xu, Bowen Shi,Hao Tang,Ying Liu,Jinbo Yang,Zhiyong Zhang, Xingyi Lin,Feng Pan,Jing Lü

Reports on progress in physicsno. 5 (2021): 056501-056501

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Dual Tone Mask Sraf To Improve Corner Rounding

Cheng Chi,Hao Tang,Oseo Park,Jing Xue,Jing Guo,Geng Han,Charlie King,Jeff Shearer,Sean Burns

OPTICAL MICROLITHOGRAPHY XXXIII（2021）

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Dual tone sub-resolution assist features to improve corner rounding

Cheng Chi,Hao Tang,Oseo Park,Jing Xue,Jing Guo,Geng Han,Charlie King,Jeff Shearer,Sean D. Burns

https://doi.org/10.1117/12.2550834 (2020): 103-108

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Exploration of pillar local CDU improvement options for AI applications (Conference Presentation)

Chi-Chun Liu,Hao Tang,Yann Mignot,Ashim Dutta,Jennifer Church, Saumya Sharma,Dominik Metzler,Karen Petrillo,Michael Rizzolo,Luciana Meli,John C. Arnold,Nelson Felix

Advances in Patterning Materials and Processes XXXVII (2020)

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Gd Doping Improved Resistive Switching Characteristics of TiO2-Based Resistive Memory Devices (vol 47, pg 2710, 2008)

Li-Feng Liu,Jin-Feng Kang,Hao Tang,Nuo Xu,Xiao Sun,Chen Chen,Bing Sun,Yi Wang,Xiao-Yan Liu,Xing Zhang,Ru-Qi Han

JAPANESE JOURNAL OF APPLIED PHYSICS（2017）

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Directed Self-Assembly Patterning Strategies for Phase Change Memory Applications

Robert L. Bruce,Gloria Fraczak,John M. Papalia,HsinYu Tsai,Matt BrightSky,Hiroyuki Miyazoe,Yu Zhu,Sebastian U. Engelmann,Hsiang-Lan Lung,Takeshi Masuda,Koukou Suu, Chi-Chun Liu,Hao Tang,John C. Arnold,Nelson Felix,Chung H. Lam

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（2017）

引用2浏览0引用

BEOL process integration for the 7 nm technology node

Theodorus E. Standaert,Genevieve Beique,H.-C. Chen,Shyng-Tsong Chen,B. Hamieh,Joe Lee,Paul S. McLaughlin, J. McMahon,Yann Mignot,Koichi Motoyama,Son Van Nguyen,Raghuveer Patlolla,Brown Peethala, Deepika Priyadarshini,M. Rizzolo,Nicole Saulnier, Hosadurga Shobha,S. Siddiqui, Terry A. Spooner,H. Tang,O. van der Straten,E. Verduijn,Yongan Xu,Xunyuan Zhang,John C. Arnold, Donald F. Canaperi,Matthew E. Colburn,Daniel C. Edelstein,Vamsi Paruchuri,Griselda Bonilla

2016 IEEE International Interconnect Technology Conference / Advanced Metallization Conference (IITC...（2016）

引用32浏览0EIWOS引用

Comparison of Left and Right Side Line Edge Roughness in Lithography

Lei Sun,Nicole Saulnier,Genevieve Beique,Erik Verduijn,Wenhui Wang,Yongan Xu,Hao Tang,Yulu Chen,Ryoung-han Kim,John Arnold,Nelson Felix,Matthew Colburn

METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXX（2016）

引用16浏览0引用

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