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个人简介
Tae Seung Cho (Member, IEEE) received the B.S., M.S., and Ph.D. degrees from Kwangwoon University, Seoul, South Korea, in 1995, 1998, and 2002, respectively. From 2002 to 2003, he was with the Stevens Institute of Technology, Hoboken, NJ, USA, as a Research Scholar, where he worked on the applications of dielectric barrier discharge and capillary discharge. From 2003 to 2005, he was a Senior Engineer with Plasmion Corporation, Hoboken, where his research concern was the capillary plasma application for surface modification and flat panel display. From 2005 to 2010, he was with the Research and Development Center and PDP Development Team, Samsung SDI Company, Ltd., Cheonan, South Korea, as a Senior Engineer. From 2010 to 2012, he was a Research Scholar with the Center for Plasma Material Interactions, University of Illinois at Urbana-Champaign. He is currently working as a Senior Staff Scientist with Applied Materials, Inc., in Santa Clara, CA, USA. His current research fields are in plasma diagnostics, microplasma applications, dielectric barrier discharge, atmospheric plasma application, remote plasma process, and plasma processing for microelectronics kindustry.
研究兴趣
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Physica medica (2022): S70-S70
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Y. -W. Jeon,S. -S. Park, J. -H. Yoon, S. -E. Lee,K. -S. Eom,Y. -J. Kim,H. -J. Kim, S. Lee,C. -K. Min,J. -W. Lee,W. -S. Min,S. -G. Cho
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作者统计
#Papers: 166
#Citation: 1533
H-Index: 23
G-Index: 32
Sociability: 7
Diversity: 0
Activity: 0
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