G. Cicala

Grazia Cicala received the degree in chemistry with full marks and honours from the Chemistry Department, Bari University, Bari, Italy, in 1981. From 1986 to 2001, she was Consiglio Nazionale delle Ricerche (CNR) Researcher at the Centro di Studio per la Chimica dei Plasmi of Bari. Her research interests include the development of diagnostic techniques of plasma systems (parallel plate reactor working at RF of 13.56 and 27 MHz) for the deposition of amorphous and nanocrystalline silicon and its alloys. From 2002 up to now, she is a CNR Primo Ricercatore at Istituto di Metodologie Inorganiche e dei Plasmi and successively at Istituto di Nanotecnologia of Bari. Since 2003, she is managing the CNR activities on carbon based materials deposited by RF and microwave (2.45 GHz) plasma (teflon-like films, polymerlike carbon films, diamond like carbon films, poly- and nano-crystalline diamond films), and by pulsed spray technique (nanodiamond particle layers). She is the author of three chapters of book, more than 150 publications on international journal and proceeding books, and one patent.