Dongbo Xu - imec | 人才画像

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论文共 30 篇作者统计合作学者相似作者

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OPC and Modeling Solution Towards 0.55NA EUV Stitching

Dongbo Xu,Werner Gillijns,Stewart Wu, Abdulrazaq Adams,Vincent Wiaux,Vicky Philipsen,Xima Zhang,Edita Tejnil,Germain Fenger

OPTICAL AND EUV NANOLITHOGRAPHY XXXVII (2024)

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Improving OPC Model Accuracy of Dry Resist for Low K1 EUV Patterning

Dongbo Xu,Werner Gillijns,Stewart Wu, Shruti Jambaldinni,Benjamin Kam,Anuja De Silva,Germain Fenger

DTCO AND COMPUTATIONAL PATTERNING III (2024)

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Design and Mask Optimization Toward Low Dose EUV Exposure

Dongbo Xu,Werner Gillijns,Ryoung-han Kim

DTCO and Computational Patterning (2022)

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Investigation of Low-N Mask in 0.33 NA EUV Single Patterning at Pitch 28nm Metal Design

Dongbo Xu,Werner Gillijns,Ling Ee Tan,Vicky Philipsen,Ryoung-han Kim

Optical and EUV Nanolithography XXXV（2022）

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EUV Low-N Attenuated Phase-Shift Mask on Random Logic Via Single Patterning at Pitch 36Nm

Ling Ee Tan,Werner Gillijns,Jae Uk Lee,Dongbo Xu,Jeroen Van de Kerkhove,Vicky Philipsen,Ryoung-han Kim

Optical and EUV Nanolithography XXXV (2022)

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Extend 0.33 NA extreme ultraviolet single patterning to pitch 28-nm metal design by low-n mask

Dongbo Xu,Werner Gillijns,Ling Ee Tan,David Rio,Max Delorme,Vicky Philipsen,Ryoung-han Kim

JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3no. 4 (2022)

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Exploration of alternative mask for 0.33NA extreme ultraviolet single patterning at pitch 28-nm metal design

Dongbo Xu,Werner Gillijns,Ling Ee Tan,Vicky Philipsen,Ryoung-Han Kim

JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3（2022）

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NXE:3400 OPC Process Monitoring: Model Validity Vs. Process Variability

Dongbo Xu,David Rio,Werner Gillijns,Max Delorme,Christina Baerts

Extreme Ultraviolet (EUV) Lithography XII (2021)

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EUV Single Patterning Exploration for Pitch 28 Nm

Dongbo Xu,Werner Gillijns,Youssef Drissi,Ling Ee Tan,Apoorva Oak,Ryoung-han Kim

DESIGN-PROCESS-TECHNOLOGY CO-OPTIMIZATION XV (2021)

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28Nm Pitch Single Exposure Patterning Readiness by Metal Oxide Resist on 0.33NA EUV Lithography

D. De Simone,L. Kljucar,P. Das,R. Blanc, C. Beral,J. Severi,N. Vandenbroeck,P. Foubert, A. Charley, A. Oak,D. Xu,W. Gillijns,J. Mitard,Z. Tokei,M. van der Veen,N. Heylen,L. Teugels,Q. T. Le,F. Schleicher,P. Leray,K. Ronse,Il Hwan Kim,Insung Kim,Changmin Park, Jisun Lee,Koungmin Ryu,P. De Schepper, J. Doise,M. Kocsis

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY XII (2021)

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