Christophe Jany

Christophe Jany received the Ph.D. degree in materials science from the University of Paris XIII, France, in 1998. He studied thin film technology of CVD Diamond on Silicon. He joined the Alcatel Research & Innovation Center, Marcoussis, in 1999 to develop optical III-V technology (InP-like), including high speed (>40 Gb/s) integrated Lasers and electro-absorption Modulators, and PhotoDetectors (InP/InGaAs-like). Within Bell Labs France, he contributed to the development of new InP-based platforms integration using SAG and SIBH Technologies. Then, with III-V Lab, he became expert in the field of photonic integration with over 20 years of experience for manufacturing components: InP-based Photonic Integrated Circuits (PICs). For ten years, he develops the hybrid technology III-V on SOI, leading to the Silicon Photonics chips. He main focuses to make compatible manufacturing III-V wafers bonded on CMOS material. In 2013, he joined CEA-Leti to further develop fabrication technology of III-V materials on SOI Wafers, mainly for silicon photonics (Edge-emitting lasers /EELs and vertical cavity surface emitting lasers/Vcsel) and Solar applications. Since 2016, he investigated optical devices in the field of direct GaAs/InP-on-Si epitaxy. Recently, he participated in the development of technologies on SiC. Christophe Jany (CEA-Leti Expert Senior) has authored or coauthored more than 170 scientific publications in peer reviewed journals, and 8 patents. He is currently the Head of the Front-End Processes Laboratory (100–150 mm line), CEA-Leti.