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论文共 9 篇作者统计合作学者相似作者
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PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY X (2003): 990-1004
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (2002)
Hn Chapman,Ak Ray-Chaudhuri,Da Tichenor,Wc Replogle,Rh Stulen,Gd Kubiak,Pd Rockett,Le Klebanoff,D O'Connell,Ah Leung, Kl Jefferson, Jb Wronosky, Js Taylor,Lc Hale,K Blaedel, Ea Spiller,Ge Sommargren,Ja Folta,Dw Sweeney, Em Gullikson,P Naulleau,Ka Goldberg,J Bokor,Dt Attwood, U Mickan, R Hanzen,E Panning,Py Yan,Cw Gwyn,Sh Lee
DA Tichenor,AK Ray-Chaudhuri,SH Lee,HN Chapman,WC Replogle,KW Berger,RH Stulen,GD Kubiak,LE Klebanoff,JB Wronosky,DJ O'Connell,AH Leung,KL Jefferson,WP Ballard,LC Hale,K Blaedel,JS Taylor,JA Folta,E Spiller,R Soufli,GE Sommargren,DW Sweeney,P Naulleau,KA Goldberg,EM Gullikson,J Bokor,DT Attwood, U Mickan, R Hanzen,E Panning,PY Yan,JE Bjorkholm,CW Gwyn
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (2001)
SPIE Proceedings20th Annual BACUS Symposium on Photomask Technology (2001)
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#Papers: 9
#Citation: 529
H-Index: 8
G-Index: 8
Sociability: 4
Diversity: 1
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