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Validation of Non-Destructive 3D Probe-Based Metrology for EUV Lithography
Nelda Antonovaité, Shinn-Sheng Yu, Khalid Elsayed,Erik Simons, Hokyun Chin, Arseniy Kalinin, Irene Battisti, Helda Pahlavani, Seokhan Kim, Artem Khachaturiants, Niranjan Saikumar, Rudolf Wilhelm, Hamed Sadeghian
openalex（2024）
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Feature Identification for Parameter Extraction and Defect Detection Using Machine Learning
Y. Guo, H. Pahlavani, A. Khachaturiants, K. Elsayed, J. van de Laar,E. Simons, N. Saikumar, H. Sadeghian
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVIII (2024)
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High-NA EUV photoresist metrology using high-throughput scanning probe microscopy
Marta Mucientes, Artem Khachaturiants, Robert Trussell,Arseniy Kalinin, Yan Guo,Erik C. Simons, Seokhan Kim, Oleg Nadyarnykh,Alain Moussa,Janusz Bogdanowicz,Joren Severi,Gian Lorusso,Danilo De Simone,Anne-Laure Charley,Philippe Leray, Maarten E. van Reijzen,Cornel Bozdog,Hamed Sadeghian
Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology (2022)
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Subsurface Scanning Probe Metrology for Overlay through Opaque Layers
I Battisti, K. M. Makles,M. S. J. Mucientes, Y. Guo,E. Simons,J. Bogdanowicz, A. Moussa, V Blanco,F. Yasin,D. Crotti, A-L Charley,P. Leray, M. E. van Reijzen,C. Bozdog,H. Sadeghian
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVI (2022)
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作者统计

#Papers: 9

#Citation: 42

H-Index: 3

G-Index: 6

Sociability: 4

Diversity: 0

Activity: 0

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