谷歌浏览器插件
订阅小程序
在清言上使用
VIPCreated with Sketch.
研究兴趣

论文共 14 篇作者统计合作学者相似作者

按年份排序按引用量排序主题筛选期刊级别筛选合作者筛选合作机构筛选
时间
引用量
主题
期刊级别
合作者
合作机构
Assessing Need and Methodology for Mask Constraints in ILT Applications
Mohamed Ramadan, Christopher J. Progler, Henry Kamberian, Jinju Beineke, Michael Green, Guangming Xiao, Ming-Feng Shen, Kai-Hsiang Chang, Kyle Braam, Alex Zepka, Yu-Po Tang, Szu Ping Chen, Eric Huang, Gloria Yeh, Nicole Wu, Chun-Cheng Liao
Photomask Technology 2024 (2024)
引用0浏览0引用
0
0
Process Matching and Mask Error Characterization of Standard Mask Processes Using Electron Beam (EB) Mask Simulation
Mohamed Ramadan, Jirka Schatz, Young M. Ham, Juergen Preuninger, Hans-Jurgen Stock, Heath Wheeler, Chris Progler
Photomask Technology 2024 (2024)
引用0浏览0引用
0
0
Low-n Absorber EUV Masks: Mask Manufacturing Assessment Through Process Characterization and Optimization with Early Look at EUV Low-NA and High-NA Imaging Performance
Henry H. Kamberian,Jed Rankin, Jinju Beineke, Romain Lallement, Michael Green, Martin Burkhardt,Mohamed Ramadan, Scott Halle, Rajiv Sejpal, Oseo Park, Sriharsha Sudhindra, Chris Progler
Photomask Technology 2024 (2024)
引用0浏览0引用
0
0
Model based mask process correction for EUV Mask
Mohamed Ramadan,Brian Dillon,Michael Green,Chris Progler,Young Ham, Ahmad Syukri
Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology (2021): 23-30
引用0浏览0引用
0
0
Patterning Solutions For Ntd Contact Hole Levels In Advanced Dram Nodes
Michael Green, Tsu-Wen Huang,Mohamed Ramadan, Hung-Chang Szu, Yeu Dong Gau, Chih-Ying Tsai,Young Ham,Chun-Cheng Liao,Lucien Bouchard,Eric Huang, Wei-Cheng Shiu,Chris Progler
PHOTOMASK TECHNOLOGY 2020 (2020)
引用0浏览0引用
0
0
加载更多
作者统计

#Papers: 12

#Citation: 1

H-Index: 1

G-Index: 1

Sociability: 3

Diversity: 1

Activity: 0

  • 合作者
  • 学生
  • 导师
暂无相似学者，你可以通过学者研究领域进行搜索筛选
数据免责声明
页面数据均来自互联网公开来源、合作出版商和通过AI技术自动分析结果，我们不对页面数据的有效性、准确性、正确性、可靠性、完整性和及时性做出任何承诺和保证。若有疑问，可以通过电子邮件方式联系我们：report@aminer.cn