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个人简介
Hans Butler received the M.Sc. and Ph.D. degrees in model reference
adaptive control from the Delft University of Technology, Delft, The Netherlands, in 1986 and 1990, respectively.
In 1991, he joined ASML and has worked on multiple components in lithographic tools as a Control Engineer, such as
handlers, illuminators, projection systems, and stages. Within ASML's Mechatronic Systems Development Department, he
has led groups working on actuators, optomechatronics, dynamics, vibration isolation, and damping. Since 2010, he has
been an ASML Fellow with dynamics and control as his main focus area. In 2012, he was appointed as a Part Time
Professor on Lithographic Scanner Control at the Eindoven University of Technology, Eindoven, The Netherlands.
研究兴趣
论文共 127 篇作者统计合作学者相似作者
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IEEE CONTROL SYSTEMS LETTERS (2023): 2593-2598
IFAC-PapersOnLineno. 2 (2023): 4068-4073
2023 62ND IEEE CONFERENCE ON DECISION AND CONTROL, CDC (2023): 4530-4535
2023 American Control Conference (ACC) (2023)
CoRR (2023): 1153-1158
2022 IEEE 61ST CONFERENCE ON DECISION AND CONTROL (CDC)pp.1497-1502, (2022)
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作者统计
#Papers: 127
#Citation: 2675
H-Index: 25
G-Index: 39
Sociability: 5
Diversity: 0
Activity: 1
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