基本信息
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职业迁徙
个人简介
Ying-Lang Wang received the B.S. degree in physics from National Tsing-Hua University, Hsinchu, Taiwan, R.O.C., in 1988 and the M.S. degree in materials science and engineering from National Sun Yat-Sen University, Kaohsiung, Taiwan, R.O.C., in 1990. In 1997, he received the Ph.D. degree in electronics engineering from National Chiao-Tung University, Hsinchu, Taiwan, R.O.C.
He joined Taiwan Semiconductor Manufacturing Company (TSMC) from 1992 till now and is presently the department manager of the thin film and diffusion engineering department. During this period, he involved the development of thin film and diffusion process of 0.25-, 0.18-, and 0.13-$\mu{\hbox{m}}$ technology generations. He is also an invited lecturer of National Chi-Nan University, National Chiyi University and National Cheng-Kung University. His research interests are in the area of chemical mechenical polishing (CMP), chemical vapor deposition (CVD), metallorganic CVD (MOCVD), physical vapor deposition (PVD), diffusion and Cleaning. He has published 53 technical papers and holds 43 R.O.C. patents and 29 U.S. patents.
研究兴趣
论文共 159 篇作者统计合作学者相似作者
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Metalurgijano. 2 (2024): 226-228
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The journal of physical chemistry lettersno. 24 (2023): 5580-5585
Annals of Oncology (2023)
Carbon (2023): 648-658
Studies in health technology and informatics (2023): 238-244
user-5f8411ab4c775e9685ff56d3(2020)
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作者统计
#Papers: 163
#Citation: 3866
H-Index: 31
G-Index: 56
Sociability: 6
Diversity: 4
Activity: 6
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