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Chemical, Structural, and Electrical Changes in Molecular Layer-Deposited Hafnicone Thin Films after Thermal Processing

Vamseedhara Vemuri,Sean W. King,Ryan Thorpe, Andrew H. Jones,John T. Gaskins,Patrick E. Hopkins,Nicholas C. Strandwitz

ACS APPLIED ELECTRONIC MATERIALS（2024）

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关键词
ALD,MLD,hybrid films,thermal processing,low-k,etch stops,annealing,thin films
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