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Improving EUV sub-40nm via single patterning using wavefront and pupil co-optimization

Soojung Kim, No Young Chung, Kwangseok Maeng, Hyunjae Cho, Jerry Lim, Hyungrok Jang, Jae Hyoung Kim, Insung Kim,Eelco van Setten, Hidde Keizers, Ajinkya Patil, Steven Beekmans, Jungtae Lee, Ki-Seok Kim, James Lee, Sung-Woon Park, Jialei Tang,Stephen Hsu, Youping Zhang, Paul Derks

Optical and EUV Nanolithography XXXVII（2024）

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