Area-Selective Atomic Layer Deposition of Ruthenium Thin Films Using Aldehyde Inhibitors
2023 IEEE INTERNATIONAL INTERCONNECT TECHNOLOGY CONFERENCE, IITC AND IEEE MATERIALS FOR ADVANCED METALLIZATION CONFERENCE, MAM, IITC/MAM（2023）
关键词
area-selective atomic layer deposition,Ru ALD,aldehyde inhibitor,self-assembled monolayer
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