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Hybrid simulation of the plasma characteristics in a dual-frequency dual-antenna inductively coupled plasma discharge

Xiao-Yan Sun, Ming-Hui Yang,Wei-Li Shao, Xin Tao, Long-Wei Li

CONTRIBUTIONS TO PLASMA PHYSICS(2024)

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摘要
Dual-frequency (DF) dual-antenna inductively coupled plasma (ICP) sources have been proposed as one of the methods to produce large-area uniform plasma. In this study, a hybrid model, consisting of a fluid module and an electron Monte Carlo (eMC) module, is used to further investigate the modulation of the plasma characteristics (i.e., induced electric field, electron energy distribution, electron heating mechanism, electron temperature, and plasma density) by the low-frequency (LF) and high-frequency (HF) currents in a DF argon discharge. When the inner LF current increases from 12 to 22 A at a fixed outer HF current of 10 A, the induced electric field is strengthened near the LF coil and weakened near the HF coil. The fraction of high-energy electrons at different spatial positions increases with the increase of LF current, which is caused by the sufficient collision heating in the skin layer of LF source, leading to an increase in electron temperature. When the outer HF current rises from 7 to 13 A with the inner LF current fixed at 17 A, the induced electric field is enhanced near the HF coil and weakened near the LF coil. The fraction of low-energy electrons at different positions increases with the increase of HF current since the energetic electrons from the skin layer of HF source are cooled due to the ionization, excitation, and stepwise ionization collisions between electrons and neutral particles, as well as the weakened induced electric field near the LF coil. As a result, the electron temperature drops with the increase of HF current. Moreover, when the LF and HF currents increase, the plasma density increases, and the distribution of plasma density is also significantly modulated.
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关键词
dual-frequency dual-antenna,electron energy distribution,hybrid model,inductively coupled plasma source,plasma parameters
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