Design and Fabrication of Highly Selective Polarizers Using Metallic–Dielectric Gratings
Photonics(2023)
摘要
Polarization imaging has been proven as an important technique for obtaining multi-dimensional information in complex environments. As the prevalent polarizers, metal gratings are widely used especially for focal-plane detection due to their flexibility and easy integration. However, high-performance polarization gratings with high transmittance and large extinction ratios typically need a large aspect ratio in design, resulting in more difficulties in fabrication with limited practical performances. In this study, we designed and fabricated a high-performance polarizer using metallic–dielectric gratings (MDGs). Through a single CMOS-compatible procedure that included electron-beam lithography (EBL) and a collimated thermal evaporation deposition process, we achieved a high TM transmittance (~90%) and a high extinction ratio (~100:1) in the experiment. We believe that our work provides an effective approach to high-performance polarization gratings, which could contribute to the development of on-chip integrated polarization imaging.
更多查看译文
关键词
polarization gratings,TM transmittance,extinction ratio,metallic–dielectric gratings,electron-beam lithography,collimated thermal evaporation
AI 理解论文
溯源树
样例
![](https://originalfileserver.aminer.cn/sys/aminer/pubs/mrt_preview.jpeg)
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要